Technology and characterization of MIS structures with co-doped silicon nanocrystals (Si-NCs) embedded in hafnium oxide (HfO x ) ultra-thin layers

Mazurak, A.; Mroczyński, R.; Jasiński, J.; Tanous, D.; Majkusiak, B.; Kano, S.; Sugimoto, H.; Fujii, M.; Valenta, J.

期刊名称Microelectronic Engineering
作者Mazurak, A.; Mroczyński, R.; Jasiński, J.; Tanous, D.; Majkusiak, B.; Kano, S.; Sugimoto, H.; Fujii, M.; Valenta, J.
印刷ISSN0167-9317
文件大小1134.67KB
发表时间2017-5
DOI10.1016/j.mee.2017.05.050

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