发现好书期刊,享受阅读乐趣

海量图书期刊资源,随时随地畅享阅读乐趣

Chemical mechanical planarization of germanium using oxone ®  based silica slurries

Chemical mechanical planarization of germanium using oxone ® based silica slurries

Nair, Reshma R.; Gupta, Apeksha; Victoria, S. Noyel; Manivannan, R.
  • 期刊名称Wear
  • 作者Nair, Reshma R.; Gupta, Apeksha; Victoria, S. Noyel; Manivannan, R.
  • 印刷ISSN0043-1648
  • 文件大小571.44KB
  • 发表时间2017-04
  • DOI10.1016/j.wear.2016.11.030
  • 页码86-90
← 返回【学霸图书馆】主页