High-Resolution Quantum Dot Photopatterning via Interference Lithography Assisted Microstamping

Malak, Sidney T.; Liang, Guanquan; Thevamaran, Ramathasan; Yoon, Young Jun; Smith, Marcus J.; Jung, Jaehan; Lin, Chun Hao; Lin, Zhiqun; Thomas, Edwin L.; Tsukruk, Vladimir V.

期刊名称The Journal of Physical Chemistry C
作者Malak, Sidney T.; Liang, Guanquan; Thevamaran, Ramathasan; Yoon, Young Jun; Smith, Marcus J.; Jung, Jaehan; Lin, Chun Hao; Lin, Zhiqun; Thomas, Edwin L.; Tsukruk, Vladimir V.
卷第121卷
期第24期
印刷ISSN1932-7447
电子ISSN1932-7455
文件大小1873.13KB
发表时间2017-06-22
DOI10.1021/acs.jpcc.7b03731
页码13370-13380

发现好书期刊，享受阅读乐趣

High-Resolution Quantum Dot Photopatterning via Interference Lithography Assisted Microstamping