Nanofabrication by field-emission scanning probe lithography and cryogenic plasma etching
Lenk, Claudia; Hofmann, Martin; Lenk, Steve; Kaestner, Marcus; Ivanov, Tzvetan; Krivoshapkina, Yana; Nechepurenko, Diana; Volland, Burkhard; Holz, Mathias; Ahmad, Ahmad; Reum, Alexander; Wang, Chen; Jones, Mervyn; Durrani, Zahid; Rangelow, Ivo W.
- 期刊名称Microelectronic Engineering
- 作者Lenk, Claudia; Hofmann, Martin; Lenk, Steve; Kaestner, Marcus; Ivanov, Tzvetan; Krivoshapkina, Yana; Nechepurenko, Diana; Volland, Burkhard; Holz, Mathias; Ahmad, Ahmad; Reum, Alexander; Wang, Chen; Jones, Mervyn; Durrani, Zahid; Rangelow, Ivo W.
- 印刷ISSN0167-9317
- 文件大小1186.80KB
- 发表时间2018-2
- DOI10.1016/j.mee.2018.01.022