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A Novel Variation of Lateral Doping Technique in SOI LDMOS With Circular Layout

A Novel Variation of Lateral Doping Technique in SOI LDMOS With Circular Layout

Yang, Kemeng; Guo, Yufeng; Pan, David Z.; Zhang, Jun; Li, Man; Tong, Yi; He, Lin; Yao, Jiafei
  • 期刊名称IEEE Transactions on Electron Devices
  • 作者Yang, Kemeng; Guo, Yufeng; Pan, David Z.; Zhang, Jun; Li, Man; Tong, Yi; He, Lin; Yao, Jiafei
  • 卷第65卷
  • 期第4期
  • 印刷ISSN0018-9383
  • 电子ISSN1557-9646
  • 文件大小3252.60KB
  • 发表时间2018-4
  • DOI10.1109/TED.2018.2808193
  • 页码1447-1452
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