Investigation of Forward Voltage Degradation due to Process-Induced Defects in 4H-SiC MOSFET
Konishi, Kumiko; Fujita, Ryusei; Mori, Yuki; Shima, Akio
- 期刊名称Materials Science Forum
- 作者Konishi, Kumiko; Fujita, Ryusei; Mori, Yuki; Shima, Akio
- 卷第924卷
- 电子ISSN1662-9752
- 文件大小1400.54KB
- 发表时间2018-6
- DOI10.4028/www.scientific.net/MSF.924.365
- 页码365-368