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The kinetics of lattice distortion introduction and lattice relaxation at the surface of thermally-oxidized 4H-SiC (0001)

The kinetics of lattice distortion introduction and lattice relaxation at the surface of thermally-oxidized 4H-SiC (0001)

Hatmanto, Adhi Dwi; Kita, Koji
  • 期刊名称Applied Physics Express
  • 作者Hatmanto, Adhi Dwi; Kita, Koji
  • 卷第12卷
  • 期第5期
  • 印刷ISSN1882-0778
  • 电子ISSN1882-0786
  • 文件大小694.91KB
  • 发表时间2019-05-01
  • DOI10.7567/1882-0786/ab103e
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