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Atomic layer deposition of stoichiometric In
<sub/>2</sub>
O
<sub/>3</sub>
films using liquid ethylcyclopentadienyl indium and combinations of H
<sub/>2</sub>
O and O
<sub/>2</sub>
plasma

Atomic layer deposition of stoichiometric In ₂ O ₃ films using liquid ethylcyclopentadienyl indium and combinations of H ₂ O and O ₂ plasma

Mizutani, Fumikazu; Higashi, Shintaro; Inoue, Mari; Nabatame, Toshihide

期刊名称AIP Advances
作者Mizutani, Fumikazu; Higashi, Shintaro; Inoue, Mari; Nabatame, Toshihide
卷第9卷
期第4期
电子ISSN2158-3226
文件大小1619.32KB
发表时间2019-04
DOI10.1063/1.5081727

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