Low-Temperature Deposition of Inorganic-Organic HfO2-PMMA Hybrid Gate Dielectric Layers for High Mobility ZnO Thin-film Transistors
Mullapudi, Gouri Syamala Rao; Velazquez-Nevarez, Gonzalo Alonso; Avila-Avendano, Carlos; Torres-Ochoa, Jorge Alejandro; Quevedo-López, Manuel A.; Ramírez Bon, Rafael
- 期刊名称ACS Applied Electronic Materials
- 作者Mullapudi, Gouri Syamala Rao; Velazquez-Nevarez, Gonzalo Alonso; Avila-Avendano, Carlos; Torres-Ochoa, Jorge Alejandro; Quevedo-López, Manuel A.; Ramírez Bon, Rafael
- 印刷ISSN2637-6113
- 电子ISSN2637-6113
- 文件大小1462.14KB
- 发表时间2019-05-29
- DOI10.1021/acsaelm.9b00175