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High-rate deposition of silicon nitride thin films using plasma-assisted reactive sputter deposition

Takenaka, Kosuke; Setsuhara, Yuichi; Han, Jeon Geon; Uchida, Giichiro; Ebe, Akinori

期刊名称Thin Solid Films
作者Takenaka, Kosuke; Setsuhara, Yuichi; Han, Jeon Geon; Uchida, Giichiro; Ebe, Akinori
卷第685卷
印刷ISSN0040-6090
文件大小803.94KB
发表时间2019-09
DOI10.1016/j.tsf.2019.06.049
页码306-311