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Modeling and Analysis of Electro-thermal Impact of Crosstalk Induced Gate Oxide Reliability in Pristine and Intercalation Doped MLGNR Interconnects

Modeling and Analysis of Electro-thermal Impact of Crosstalk Induced Gate Oxide Reliability in Pristine and Intercalation Doped MLGNR Interconnects

Das, Subhajit; Bhattacharya, Sandip; Das, Debaprasad; Rahaman, Hafizur

期刊名称IEEE Transactions on Device and Materials Reliability
作者Das, Subhajit; Bhattacharya, Sandip; Das, Debaprasad; Rahaman, Hafizur
印刷ISSN1530-4388
电子ISSN1558-2574
文件大小3899.42KB
发表时间2019
DOI10.1109/TDMR.2019.2933035
页码1-1

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