[IEEE 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2019.5.6-2019.5.9)] 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Methods for RFSOI Damascene Tungsten Contact Etching
- 作者Vaughn, Daisy; Anderson, Felix; Meunier, Ron; Doan, Thai; Stamper, Anthony
- 文件大小2740.77KB
- 发表时间2019
- DOI10.1109/asmc.2019.8791820
- 页码1-4
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