Stable Sub-Loop Behavior in Ferroelectric Si-Doped HfO 2
- 期刊名称ACS Applied Materials & Interfaces
- 作者Lee, Kyoungjun; Lee, Hyeon Jae; Lee, Tae Yoon; Lim, Hong Heon; Song, Myeong Seop; Yoo, Hyang Keun; Suh, Dong Ik; Lee, Jae Gil; Zhu, Zhongwei; Yoon, Alexander; MacDonald, Matthew R; Lei, Xinjian; Park, Kunwoo; Park, Jungwon; Lee, Jun Hee; Chae, Seung Chul
- 印刷ISSN1944-8244
- 电子ISSN1944-8252
- 文件大小851.55KB
- 发表时间2019-10-02
- DOI10.1021/acsami.9b12878
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