[IEEE 2019 19th International Workshop on Junction Technology (IWJT) - Kyoto, Japan (2019.6.6-2019.6.7)] 2019 19th International Workshop on Junction Technology (IWJT) - Review of applications of Defect Photoluminescence Imaging (DPLI) during IC processing
Jastrzebski, L.; Roffarello, ; Nadudvari, G.; Kiss, Z.; Lajtos, I.; Pongracz, A.; Molnar, G.; Nagy, M.; Dudas, L.; Basa, P.; Greenwood, B.; Duru, R.; Gambino, J.; Le-Cunff, D.; Cannac, M.; Joblot, S.; Mica, I.; Polignano, M. L.; Galbiati, A.; Monge, P.
- 作者Jastrzebski, L.; Roffarello, ; Nadudvari, G.; Kiss, Z.; Lajtos, I.; Pongracz, A.; Molnar, G.; Nagy, M.; Dudas, L.; Basa, P.; Greenwood, B.; Duru, R.; Gambino, J.; Le-Cunff, D.; Cannac, M.; Joblot, S.; Mica, I.; Polignano, M. L.; Galbiati, A.; Monge, P.
- 文件大小1153.47KB
- 发表时间2019
- DOI10.23919/iwjt.2019.8802893
- 页码1-6