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Structural and Electrical Comparison of Si and Zr Doped Hafnium Oxide Thin Films and Integrated FeFETs Utilizing Transmission Kikuchi Diffraction

Structural and Electrical Comparison of Si and Zr Doped Hafnium Oxide Thin Films and Integrated FeFETs Utilizing Transmission Kikuchi Diffraction

Lederer, Maximilian; Kämpfe, Thomas; Vogel, Norman; Utess, Dirk; Volkmann, Beate; Ali, Tarek; Olivo, Ricardo; Müller, Johannes; Beyer, Sven; Trentzsch, Martin; Seidel, Konrad; Eng, and Lukas M.
  • 期刊名称Nanomaterials
  • 作者Lederer, Maximilian; Kämpfe, Thomas; Vogel, Norman; Utess, Dirk; Volkmann, Beate; Ali, Tarek; Olivo, Ricardo; Müller, Johannes; Beyer, Sven; Trentzsch, Martin; Seidel, Konrad; Eng, and Lukas M.
  • 卷第10卷
  • 期第2期
  • 电子ISSN2079-4991
  • 文件大小3544.88KB
  • 发表时间2020-02-22
  • DOI10.3390/nano10020384
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