Physical analysis of remained oxidation byproducts as the origins of lattice distortion at the surface of 4H-SiC by Fourier-transform infrared spectroscopy
- 期刊名称Japanese Journal of Applied Physics
- 作者Hatmanto, Adhi Dwi; KITA, Koji
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小530.01KB
- 发表时间2020-03-13
- DOI10.35848/1347-4065/ab7fe9
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