Chemical vapor deposition of metallic films using plasma electrons as reducing agents
- 期刊名称Journal of Vacuum Science & Technology A
- 作者Nadhom, Hama; Lundin, Daniel; Rouf, Polla; Pedersen, Henrik
- 卷第38卷
- 期第3期
- 印刷ISSN0734-2101
- 电子ISSN1520-8559
- 文件大小2047.53KB
- 发表时间2020-05
- DOI10.1116/1.5142850
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