![Influence of single and double deposition temperatures on the interface quality of atomic layer deposited Al[sub 2]O[sub 3] dielectric thin films on silicon]()
Influence of single and double deposition temperatures on the interface quality of atomic layer deposited Al[sub 2]O[sub 3] dielectric thin films on siliconDuenÌas, S.; CastaÌn, H.; GarciÌa, H.; de Castro, A.; BailoÌn, L.; Kukli, K.; Aidla, A.; Aarik, J.; MaÌndar, H.; Uustare, T.; Lu, J.; HaÌrsta, A. · Journal of Applied Physics · 2006