A negative resist, LMR (low molecular weight resist), for deep UV lithographyToshio Itoh; Yoshio Yamashita; Ryuji Kawazu; Kazutami Kawamura; Seigo Ohno; Takateru Asano; Kenji Kobayashi; Gentaro Nagamatsu · 1986

Formation of thick and narrow-spacing metal patterns by lift-off technique using negative photoresists, LMR and LMR-UVYoshio Yamashita; Ryuji Kawazu; Toshio Itoh; Kazutami Kawamura; Seigo Ohno; Kenji Kobayashi; Takateru Asano; Gentaro Nagamatsu · 1985

SPIE Proceedings [SPIE Microlithography Conference - Santa Clara, CA (Monday 2 March 1987)] Advances in Resist Technology and Processing IV - <title>New PCM (HR-PCM) Technique Using Novolak-Diazide Type Photoresist As A Bottom Layer</title>Yamashita, Yoshio; Jinbo, Hideyuki; Kawazu, Ryuji; Ohno, Seigo; Asano, Takateru; Kobayashi, Kenji; Nagamatsu, Gentaro; Bowden, Murrae J. · 1987

Short Reports on PaintsJournal of the Japan Society of Colour Material · 1937

Pigments for Anticorrosive Paints. III.Matsumoto, Toku · Journal of the Japan Society of Colour Material · 1937

Silicon Surface CoatingJournal of the Japan Society of Colour Material · 1951

Physical Properties of Organic Pigments (1)Journal of the Japan Society of Colour Material · 1954

Physical properties of organic pigments (7)Journal of the Japan Society of Colour Material · 1955

Physical properties of organic pigments (6)Journal of the Japan Society of Colour Material · 1955

Studies on flush colour. INishigori, Nozomi · Journal of the Japan Society of Colour Material · 1956

Titanium Dioxide PigmentKINO, Asumu · Journal of the Japan Society of Colour Material · 1958