Electron escape depth in silicon
- 作者M. Klasson; A. Berndtsson; J. Hedman; R. Nilsson; R. Nyholm; C. Nordling
- 卷第3卷
- 期第6期
- 印刷ISSN0368-2048
- 文件大小552.55KB
- 发表时间1974
- DOI10.1016/0368-2048(74)80029-0
- 页码427-434
Mechanical analysis of maxillofacial miniplatesR.A. Loukota; J.C. Shelton · 1995
Efficiency ratios for engineering schoolsShelton, R.D.; Prabhakar, J.C. · Proceedings of the IEEE · 1971
Holographic assessment of internal fracture fixation devicesJ.C. Shelton; D. Gorman; W. Bonfield · 1990
Tendon micromechanics and its implications in mechanotransductionM. Tamiwa; H.C.R. Screen; J.C. Shelton; D.L. Bader · 2006
Inelastic mean free paths for electrons in bulk jelliumJ.C. Shelton · 1974
Microstructural stress relaxation mechanics in functionally different tendonsH.R.C. Screen; S. Toorani; J.C. Shelton · 2013
Calculation of electronic properties of amorphous alloysJ.C. Swihart; D.M.C. Nicholson; G.M. Stocks; Y. Wang; W.A. Shelton; H. Yang · 1996
Double exposure holographic interferometric evaluation of plated fracture systemsJ.C. Shelton; D. Gorman; W. Bonfield · 1989