, and
- 期刊名称Physical Review C
- 作者Nathan, A. M.; Olness, J. W.; Warburton, E. K.; McGrory, J. B.
- 卷第16卷
- 期第1期
- 印刷ISSN0556-2813
- 文件大小1611.82KB
- 发表时间1977-7-1
- DOI10.1103/PhysRevC.16.192
- 页码192-214
Proximity effect correction for nanolithographyRau, Richard · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1996
Lithography with 157 nm lasersBloomstein, T. M. · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1997
X-ray lithographyHeuberger, A. · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1988
Resolution limits of optical lithographyOkazaki, Shinji · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1991
Review of scanning force microscopySarid, Dror · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1991
Diamond nanorodsShenderova, O. A.; Padgett, C. W.; Hu, Z.; Brenner, D. W. · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 2005
Dielectric/semiconductor interfacesWieder, H. H. · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1993
Two-dimensional carrier profilingVandervorst, W. · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1992