Breakdown in silicon oxides (II)—correlation with Fe precipitates
- 期刊名称Applied Physics Letters
- 作者Honda, Kouichirou; Ohsawa, Akira; Toyokura, Nobuo
- 卷第46卷
- 期第6期
- 印刷ISSN0003-6951
- 文件大小518.70KB
- 发表时间1985
- DOI10.1063/1.95547
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