![SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Design for Manufacturability through Design-Process Integration VI - <title>Pattern matching for double patterning technology-compliant physical design flows</title>]()
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Design for Manufacturability through Design-Process Integration VI - <title>Pattern matching for double patterning technology-compliant physical design flows</title>Wang, Lynn T.; Dai, Vito; Capodieci, Luigi; Mason, Mark E. · 2012