SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Design for Manufacturability through Design-Process Integration VI - Pattern matching for double patterning technology-compliant physical design flows
- 作者Wang, Lynn T.; Dai, Vito; Capodieci, Luigi; Mason, Mark E.
- 卷第8327卷
- 印刷ISSN0277-786X
- 文件大小599.68KB
- 发表时间2012
- DOI10.1117/12.916581
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