Kinetics of silicon-germanium deposition by atmospheric-pressure chemical vapor deposition
- 期刊名称Applied Physics Letters
- 作者Kamins, T. I.; Meyer, D. J.
- 卷第59卷
- 期第2期
- 印刷ISSN0003-6951
- 文件大小643.64KB
- 发表时间1991
- DOI10.1063/1.105986
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