X-ray photoelectron spectroscopy and grazing incidence X-ray reflectivity study of silicon nitride thin films
- 作者Boquan Li; Toshiyuki Fujimoto; Natsuo Fukumoto; Kumasa Honda; Isao Kojima
- 卷第334卷
- 印刷ISSN0040-6090
- 文件大小74.48KB
- 发表时间1998
- DOI10.1016/s0040-6090(98)01132-8
- 页码140-144
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