Growth mechanism of microcrystalline silicon obtained from reactive plasmas
- 作者Akihisa Matsuda
- 卷第337卷
- 印刷ISSN0040-6090
- 文件大小716.62KB
- 发表时间1999
- DOI10.1016/s0040-6090(98)01165-1
- 页码1-6
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