Editorial board
- 期刊名称Communications in Statistics. Stochastic Models
- 卷第16卷
- 期第1期
- 印刷ISSN0882-0287
- 文件大小52.86KB
- 发表时间2000-01
- DOI10.1080/15326340008807573
[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (1998.06.9-1998.06.11)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat No 98CH36216) VLSIT-98 - 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216)1998
[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (1998.06.9-1998.06.11)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat No 98CH36216) VLSIT-98 - Author index1998
[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (1998.06.9-1998.06.11)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat No 98CH36216) VLSIT-98 - Table of contents1998
[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - Lithography solutions for sub-0.1 μm generationsSasago, M. · 1998
[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - Chemical mechanical polishing: the impact of a new technology on an industryPerry, K.A. · 1998
[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - A statistical gate CD control including OPCMisaka, A.; Goda, A.; Odanaka, S.; Kobayashi, S.; Watanabe, H. · 1998
[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - Highly robust ultra-thin gate dielectric for giga scale technologyKhare, M.; Wang, X.W.; Ma, T.P. · 1998
[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - Electromigration of submicron Damascene copper interconnectsChangsup Ryu, ; Kee-Won Kwon, ; Loke, A.L.S.; Dubin, V.M.; Kavari, R.A.; Ray, G.W.; Wong, S.S. · 1998