Dependence of Composition Distribution of NiTi Sputtered Films on Ar Gas Pressure
- 期刊名称Japanese Journal of Applied Physics
- 作者Yamazaki, Toshinari; Yoshizawa, Toshio; Takada, Hisatoshi; Takeda, Fumio; Kikuta, Toshio; Nakatani, Noriyuki; Yamabuchi, Tatsuo
- 卷第40卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小122.69KB
- 发表时间2001-12-15
- DOI10.1143/JJAP.40.6936
- 页码6936-6940
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