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Processing, microstructure and properties of chemical vapour deposited TiN/AIN films

Processing, microstructure and properties of chemical vapour deposited TiN/AIN films

Yoshikawa, Noboru; Aoki, Masato; Kikuchi, Atsushi; Taniguchi, Shoji
  • 期刊名称International Journal of Materials and Product Technology
  • 作者Yoshikawa, Noboru; Aoki, Masato; Kikuchi, Atsushi; Taniguchi, Shoji
  • 卷第16卷
  • 印刷ISSN0268-1900
  • 电子ISSN1741-5209
  • 文件大小1435.55KB
  • 发表时间2001
  • DOI10.1504/ijmpt.2001.005402
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