![W chemical-vapor deposition using (i-C[sub 3]H[sub 7]C[sub 5]H[sub 4])[sub 2]WH[sub 2]]()
W chemical-vapor deposition using (i-C[sub 3]H[sub 7]C[sub 5]H[sub 4])[sub 2]WH[sub 2]Ogura, Atsushi; Imai, Satoshi; Kagawa, Taihei; Kurozaki, Hirotaka; Ishikawa, Masato; Muramoto, Ikuyo; Machida, Hideaki; Ohshita, Yoshio · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 2008