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In situ measurement of the ion incidence angle dependence of the ion-enhanced etching yield in plasma reactors

In situ measurement of the ion incidence angle dependence of the ion-enhanced etching yield in plasma reactors

Belen, Rodolfo Jun; Gomez, Sergi; Kiehlbauch, Mark; Aydil, Eray S.

期刊名称Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
作者Belen, Rodolfo Jun; Gomez, Sergi; Kiehlbauch, Mark; Aydil, Eray S.
卷第24卷
期第6期
印刷ISSN0734-2101
文件大小1384.49KB
发表时间2006
DOI10.1116/1.2362725

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