Direct regrowth of thin strained silicon films on planarized relaxed silicon–germanium virtual substrates

C.W. Leitz; C.J. Vineis; J. Carlin; J. Fiorenza; G. Braithwaite; R. Westhoff; V. Yang; M. Carroll; T.A. Langdo; K. Matthews; P. Kohli; M. Rodder; R. Wise; A. Lochtefeld

作者C.W. Leitz; C.J. Vineis; J. Carlin; J. Fiorenza; G. Braithwaite; R. Westhoff; V. Yang; M. Carroll; T.A. Langdo; K. Matthews; P. Kohli; M. Rodder; R. Wise; A. Lochtefeld
卷第513卷
印刷ISSN0040-6090
文件大小294.70KB
发表时间2006
DOI10.1016/j.tsf.2006.01.063
页码300-306

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Direct regrowth of thin strained silicon films on planarized relaxed silicon–germanium virtual substrates