![SPIE Proceedings [SPIE Optical Systems Design 2005 - Jena, Germany (Monday 12 September 2005)] Optical Design and Engineering II - Mask tilt effects counteracted by wafer tilts in a Schwarzschild objective based EUV lithography setup]()
SPIE Proceedings [SPIE Optical Systems Design 2005 - Jena, Germany (Monday 12 September 2005)] Optical Design and Engineering II - Mask tilt effects counteracted by wafer tilts in a Schwarzschild objective based EUV lithography setupBollanti, S.; Mazuray, Laurent; Wartmann, Rolf; Di Lazzaro, P.; Flora, F.; Mezi, L.; Murra, D.; Torre, A. · 2005