![SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Monday 18 September 2000)] Challenges in Process Integration and Device Technology - Increasing degree of homogeneity of electrical parameters of neutron-transmuted silicon]()
SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Monday 18 September 2000)] Challenges in Process Integration and Device Technology - Increasing degree of homogeneity of electrical parameters of neutron-transmuted siliconMakhkamov, Shermakhmat; Burnett, David; Kimura, Shin'ichiro; Tursunov, Nigmatilla A.; Ashurov, Maripjon; Singh, Bhanwar; Khakimov, Zokirkhon M. · 2000