SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Alternative Lithographic Technologies - <title>REBL nanowriter: Reflective Electron Beam Lithography</title>

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Alternative Lithographic Technologies - REBL nanowriter: Reflective Electron Beam Lithography

Petric, Paul; Bevis, Chris; Brodie, Alan; Carroll, Allen; Cheung, Anthony; Grella, Luca; McCord, Mark; Percy, Henry; Standiford, Keith; Zywno, Marek; Schellenberg, Frank M.; La Fontaine, Bruno M.

作者Petric, Paul; Bevis, Chris; Brodie, Alan; Carroll, Allen; Cheung, Anthony; Grella, Luca; McCord, Mark; Percy, Henry; Standiford, Keith; Zywno, Marek; Schellenberg, Frank M.; La Fontaine, Bruno M.
卷第7271卷
印刷ISSN0277-786X
文件大小1699.76KB
发表时间2009
DOI10.1117/12.817319

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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Alternative Lithographic Technologies - REBL nanowriter: Reflective Electron Beam Lithography