Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
- 作者G. Dingemans; R. Seguin; P. Engelhart; M. C. M. van de Sanden; W. M. M. Kessels
- 卷第4卷
- 印刷ISSN1862-6254
- 电子ISSN1862-6270
- 文件大小304.64KB
- 发表时间2010
- DOI10.1002/pssr.200903334
- 页码10-12
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