Crystal Growth Technology (Semiconductors and Dielectrics) || Modeling and Optimization of Oxide Crystal Growth
- 作者Capper, Peter; Rudolph, Peter
- 文件大小420.11KB
- 发表时间2010
- DOI10.1002/9783527632879.ch12
- 页码211-227
Crystal Growth Technology (Semiconductors and Dielectrics) || IndexCapper, Peter; Rudolph, Peter · 2010
Crystal Growth Technology (Semiconductors and Dielectrics) || Front MatterCapper, Peter; Rudolph, Peter · 2010
Crystal Growth Technology (Semiconductors and Dielectrics) || Trends in Scintillation CrystalsCapper, Peter; Rudolph, Peter · 2010
Crystal Growth Technology (Semiconductors and Dielectrics) || Manufacturing of Bulk AlN SubstratesCapper, Peter; Rudolph, Peter · 2010
Crystal Growth Technology (Semiconductors and Dielectrics) || Crystal Machining Using Atmospheric Pressure PlasmaCapper, Peter; Rudolph, Peter · 2010
Crystal Growth Technology (Semiconductors and Dielectrics) || Modeling and Optimization of Oxide Crystal GrowthCapper, Peter; Rudolph, Peter · 2010
Crystal Growth Technology (Semiconductors and Dielectrics) || Advanced Material Development for Inertial Fusion Energy (IFE)Capper, Peter; Rudolph, Peter · 2010