![Interlayer Mediated Epitaxy of Cobalt Silicide on Silicon (100) from Low Temperature Chemical Vapor Deposition of Cobalt Formation Mechanisms and Associated Properties]()
Interlayer Mediated Epitaxy of Cobalt Silicide on Silicon (100) from Low Temperature Chemical Vapor Deposition of Cobalt Formation Mechanisms and Associated PropertiesLondergan, Ana R.; Nuesca, Guillermo; Goldberg, Cindy; Peterson, Gregory; Kaloyeros, Alain E.; Arkles, Barry; Sullivan, John J. · Journal of The Electrochemical Society · 2001