![SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Alternative Lithographic Technologies - <title>REBL nanowriter: Reflective Electron Beam Lithography</title>]()
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Alternative Lithographic Technologies - <title>REBL nanowriter: Reflective Electron Beam Lithography</title>Petric, Paul; Bevis, Chris; Brodie, Alan; Carroll, Allen; Cheung, Anthony; Grella, Luca; McCord, Mark; Percy, Henry; Standiford, Keith; Zywno, Marek; Schellenberg, Frank M.; La Fontaine, Bruno M. · 2009