![Study of alternate hardmasks for extreme ultraviolet patterning]()
Study of alternate hardmasks for extreme ultraviolet patterningDe Silva, Anuja; Seshadri, Indira; Arceo, Abraham; Petrillo, Karen; Meli, Luciana; Mendoza, Brock; Yao, Yiping; Belyansky, Michael; Halle, Scott; Felix, Nelson M. · Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena · 2016