Méthodologies tDCS/tACS/tRNS
- 期刊名称Neurophysiologie Clinique
- 作者Lefaucheur, J.P.
- 卷第49卷
- 期第3期
- 印刷ISSN0987-7053
- 文件大小279.17KB
- 发表时间2019-06
- DOI10.1016/j.neucli.2019.05.002
Proximity effect correction for nanolithographyRau, Richard · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1996
Lithography with 157 nm lasersBloomstein, T. M. · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1997
X-ray lithographyHeuberger, A. · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1988
Resolution limits of optical lithographyOkazaki, Shinji · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1991
Editorial boardMicroelectronics Journal · 2013
Timing characterization and constraining toolAmrozik, Piotr; Napieralski, Andrzej · Microelectronics Journal · 2014
Editorial boardMicroelectronics Journal · 2013
Editorial boardMicroelectronics Journal · 2013