中国文学史新著 上
- 作者章培恒，骆玉明主编
- 出版社上海：复旦大学出版社
- 标注页数483 页
- 文件页数498 页
- 文件大小32.62 MB
- 出版时间2007
- ISBN9787309054620
Chemical Vapor Deposition for Nanotechnology || Atmospheric Pressure Chemical Vapor Deposition of GrapheneMandracci, Pietro · 2019
Atmospheric Pressure Chemical Vapor Deposition of Tungsten SilicideDobkin, Daniel · Journal of The Electrochemical Society · 1990
Atmospheric Pressure Chemical Vapor Deposition of Copper Thin FilmsLai, W. G. · Journal of The Electrochemical Society · 1991
Kinetics of silicon-germanium deposition by atmospheric-pressure chemical vapor depositionKamins, T. I.; Meyer, D. J. · Applied Physics Letters · 1991
Atmospheric Pressure Chemical Vapor Deposition of 3C-SiCRussell, Michael W.; Freitas, Jaime A.; Berry, Alan D.; Butler, James E. · MRS Proceedings · 1995
Atmospheric Pressure Chemical Vapor Deposition of Gallium Nitride Thin FilmsGordon, Roy G.; Hoffman, David M.; Riaz, Umar · MRS Proceedings · 1990
Large scale atmospheric pressure chemical vapor deposition of grapheneVlassiouk, Ivan; Fulvio, Pasquale; Meyer, Harry; Lavrik, Nick; Dai, Sheng; Datskos, Panos; Smirnov, Sergei · Carbon · 2013
Atmospheric pressure chemical vapor deposition of titanium nitride on metalsJun C. Nable; Shaneela Nosheen; Steven L. Suib; Francis S. Galasso · 2006
Back coverWendland, Folkwart · Journal of Materials Chemistry · 2012
Back coverWendland, Folkwart · Journal of Materials Chemistry · 2012
Back coverWendland, Folkwart · Journal of Materials Chemistry · 2012
Back coverWendland, Folkwart · Journal of Materials Chemistry · 2012
Back coverWendland, Folkwart · Journal of Materials Chemistry · 2012
Back coverWendland, Folkwart · Journal of Materials Chemistry · 2012
Inside back coverLarsson, Göran · Journal of Materials Chemistry · 2012
Liquid crystalline 21,23-dithiaporphyrinsBromby, Ashley D.; Kan, Wang Hay; Sutherland, Todd C. · Journal of Materials Chemistry · 2012