ChemInform Abstract: ELECTRONIC ABSORPTION SPECTRA OF SUBSTITUTED CARBAZOLEQUINONES
- 期刊名称Chemischer Informationsdienst
- 作者ISSA, R. M.; EL-SAMAHY, A. A.; ISSA, I. M.; ETAIW, S. H.
- 卷第8卷
- 期第40期
- 印刷ISSN0009-2975
- 文件大小97.33KB
- 发表时间1977-10-04
- DOI10.1002/chin.197740037
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Advanced Mask Aligner Lithography (AMALITH)Lai, Kafai; Erdmann, Andreas; Voelkel, Reinhard; Vogler, Uwe; Bramati, Arianna · 2015
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Advanced coatings for next generation lithographyWood, Obert R.; Panning, Eric M.; Naujok, P.; Yulin, S.; Kaiser, N.; Tünnermann, A. · 2015
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Source mask optimization for advanced lithography nodesPoonawala, Amyn; Dusa, Mircea V.; Conley, Will; Stanton, William; Sawh, Chander · 2010
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - Advanced mask aligner lithography (AMALITH)Voelkel, Reinhard; Vogler, Uwe; Bramati, Arianna; Weichelt, Tina; Stuerzebecher, Lorenz; Zeitner, Uwe D.; Motzek, Kristian; Erdmann, Andreas; Hornung, Michael; Zoberbier, Ralph; Conley, Will · 2012
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Inverse lithography technique for advanced CMOS nodesVillaret, Alexandre; Conley, Will; Tritchkov, Alexander; Entradas, Jorge; Yesilada, Emek · 2013
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Optical Microlithography XXVI - Zero expansion glass ceramic ZERODUR <sup>®</sup> roadmap for advanced lithographyWesterhoff, Thomas; Jedamzik, Ralf; Hartmann, Peter; Conley, Will · 2013
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Extending lithography with advanced materialsWallow, Thomas I.; Hohle, Christoph K.; Guerrero, Douglas J. · 2014
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Front Matter: Volume 7636La Fontaine, Bruno M.; SPIE, Proceedings of · 2010