![[IEEE IEEE International Electron Devices Meeting 2003 - Washington, DC, USA (8-10 Dec. 2003)] IEEE International Electron Devices Meeting 2003 - A 65nm node strained SOI technology with slim spacer]()
[IEEE IEEE International Electron Devices Meeting 2003 - Washington, DC, USA (8-10 Dec. 2003)] IEEE International Electron Devices Meeting 2003 - A 65nm node strained SOI technology with slim spacerFu-Liang Yang, ; Chien-Chao Huang, ; Hou-Yu Chen, ; Jhon-Jhy Liaw, ; Tang-Xuan Chung, ; Hung-Wei Chen, ; Chang-Yun Chang, ; Cheng Chuan Huang, ; Kuang-Hsin Chen, ; Di-Hong Lee, ; Hsun-Chih Tsao, ; Cheng-Kuo Wen, ; Shui-Ming Cheng, ; Yi-Ming Sheu, ; Ke-Wei Su, ; Chi-Chun Chen, ; Tze-Liang Lee, ; Shih-Chang Chen, ; Chih-Jian Chen, ; Cheng-hung Chang, ; Jhi-cheng Lu, ; Weng Chang, ; Chuan-Ping Hou, ; Ying-Ho Chen, ; Kuei-Shun Chen, ; Ming Lu, ; Li-Wei Kung, ; Yu-Jun Chou, ; Fu-Jye Liang, ; Jan-Wen You, ; King-Chang Shu, ; Bin-Chang Chang, ; Jaw-Jung Shin, ; Chun-Kuang Chen, ; Tsai-Sheng Gau, ; Bor-Wen Chan, ; Yi-Chun Huang, ; Han-Jan Tao, ; Jyh-Huei Chen, ; Yung-Shun Chen, ; Yee-Chia Yeo, ; Fung, S.K.-H.; Diaz, C.H.; Wu, C.-M.M.; Lin, B.J.; Liang, M.-S.; Sun, J.Y.-C.; Chenming Hu, · 2003