海量图书期刊资源，随时随地畅享阅读乐趣
Mechanism of silicon film deposition in the RF plasma reduction of silicon tetrachlorideG. Bruno; P. Capezzuto; G. Cicala; F. Cramarossa · 1986
Deposition of silicon films from SiCl4 glow discharges: A kinetic model of the surface processG. Bruno; P. Capezzuto; G. Cicala; F. Cramarossa · 1987