Academic penance in a broad church
- 期刊名称Physics World
- 作者Cornwall, Malcolm G
- 卷第6卷
- 期第9期
- 印刷ISSN0953-8585
- 电子ISSN2058-7058
- 文件大小6192.44KB
- 发表时间1993-09
- DOI10.1088/2058-7058/6/9/18
- 页码21-23
Interconnection Processes and MaterialsBlonder, Greg E.; Gottscho, Richard A.; Tai, King L. · AT&T Technical Journal · 1990
B. MIGRATIONSDiMauro, L. F.; Gottscho, Richard A.; Miller, Terry A. · Historical Research · 1971
Microscopic uniformity in plasma etchingGottscho, Richard A. · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1992
Challenges in etch: What's new?Richard A. Gottscho; K. Nojiri; J. LaCara · 2008
Computer Applications in Plasma Materials ProcessingGraves, David B.; Gottscho, Richard A. · Computers in Physics · 1990
Negative Ion Kinetics in RF Glow DischargesGottscho, Richard A.; Gaebe, Carl E. · 1986
Interactions between arrayed hollow cathodesDixon, Sam; Charles, Christine; Boswell, Rod; Cox, Wes; Holland, John; Gottscho, Richard · Journal of Physics D: Applied Physics · 2013
Why teach physics?Physics World · 1997
Memristors for wearable electronicsPhysics World · 2011
The LEGO Brick ColliderPhysics World · 2015
Web life: <i>Crystallography365</i>Physics World · 2015
Through a glass, darklyCorfield, Richard · Physics World · 2015
CERN enters new territoryBanks, Michael · Physics World · 2015
Salt-flat mirrorsPhysics World · 2015
FirenadoesPhysics World · 2015