![MoS
<sub/>2</sub>
Functionalization with a Sub-nm Thin SiO
<sub/>2</sub>
Layer for Atomic Layer Deposition of High-κ Dielectrics]()
MoS
<sub/>2</sub>
Functionalization with a Sub-nm Thin SiO
<sub/>2</sub>
Layer for Atomic Layer Deposition of High-κ DielectricsZhang, Haodong; Arutchelvan, Goutham; Meersschaut, Johan; Gaur, Abhinav; Conard, Thierry; Bender, Hugo; Lin, Dennis; Asselberghs, Inge; Heyns, Marc; Radu, Iuliana; Vandervorst, Wilfried; Delabie, Annelies · Chemistry of Materials · 2017