Chemical trend observed in anisotropic surface reflectance spectra of MOVPE by surface photoabsorption
- 作者Naoki Kobayashi; Yasuyuki Kobayashi; Kunihiko Uwai
- 卷第170卷
- 印刷ISSN0022-0248
- 文件大小382.81KB
- 发表时间1997
- DOI10.1016/s0022-0248(96)00520-9
- 页码225-229
同作者推荐
Sub-atomic-layer epitaxy of Si using Si2H6Yoshiyuki Suda; Masahiro Ishida; Mitsutomi Yamashita; Hiroaki Ikeda · 1994
Growth Temperature Window and Self-Limiting Process in Sub-Atomic-Layer EpitaxyIshida, Masahiro; Yamashita, Mitsutomi; Nagata, Yoshio; Suda, Yoshiyuki · Japanese Journal of Applied Physics · 1996