海量图书期刊资源,随时随地畅享阅读乐趣
Sub-atomic-layer epitaxy of Si using Si2H6Yoshiyuki Suda; Masahiro Ishida; Mitsutomi Yamashita; Hiroaki Ikeda · 1994
Growth Temperature Window and Self-Limiting Process in Sub-Atomic-Layer EpitaxyIshida, Masahiro; Yamashita, Mitsutomi; Nagata, Yoshio; Suda, Yoshiyuki · Japanese Journal of Applied Physics · 1996